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Preventing PDMS from lifting silicon wafers in nanoscale replication

A researcher is experiencing issues with PDMS flowing underneath small silicon wafers during nanoscale replication, causing them to lift and making demolding difficult. The goal is to replicate nanoscale roughness without using sacrificial layers or methods that might interfere with the replication. The researcher seeks solutions to prevent PDMS infiltration under the wafer.

Engineering, Core Engineering, Nanotechnology